ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,617, issued on July 7, was assigned to TEXAS INSTRUMENTS Inc. (Dallas). "Cyclic etch-ash process for semiconductor processing" was invented ... Read More
ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,618, issued on July 7, was assigned to FUJIFILM Corp. (Tokyo). "Composition and method for treating substrate" was invented by Moe Narita (S... Read More
ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,619, issued on July 7, was assigned to FUJI ELECTRIC Co. LTD. (Kawasaki, Japan). "Method of manufacturing silicon carbide semiconductor devi... Read More
ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,620, issued on July 7, was assigned to CENTRAL GLASS COMPANY Ltd. (Ube, Japan). "Surface treatment method for semiconductor substrate and su... Read More
ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,621, issued on July 7, was assigned to SCREEN HOLDINGS Co. LTD. (Japan). "Replacement end time determination method, substrate processing me... Read More
ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,622, issued on July 7, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan). "Substrate processing apparatus" was invented by Tatsuhiro S... Read More
ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,623, issued on July 7, was assigned to SEMES Co. LTD (Chungcheongnam-Do, South Korea). "Substrate processing apparatus" was invented by Sang... Read More
ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,624, issued on July 7, was assigned to Semes Co. Ltd. (Cheonan-si, South Korea). "Cooling unit, apparatus for processing a substrate and met... Read More
ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,625, issued on July 7, was assigned to SINFONIA TECHNOLOGY Co. LTD. (Tokyo). "Transfer chamber" was invented by Toshihiro Kawai (Tokyo), Tak... Read More
ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,626, issued on July 7, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Low temperature measurement of semiconductor substrate... Read More